KCMC supply wide range of plasma cathode Including circular, Planar and Rotary cathode, which size can be covered from 2inch small size R&D to mass production big size up to 4,000mm

KCMC and GENCOA linear ion sources are using in lengths of 300mm up to 4000mm And Circular ion source for 230pi and 170pi including neutralizer

KCMC supply most of all kinds of material for Planar and rotary cathode sputtering system. Including Li & Mg rotary shape target using micro casting processes.

KCMC retrofit service supply Gen 8, Gen 10 size inline and Gen 6 cluster sputtering layout from Planar cathode to Rotary Cathode. And also supply various Rotary cathode type modification for R2R sputtering system.

KCMC linear ion sources are using in lengths of 300mm to 4000mm And Circular ion source for 230pi and 170pi including neutralizer